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TECHNOLOGY AND International |
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| F. Amirouche, USA A. Anayiotos, USA T Bajd, Slovenia A. Cappozzo, Italy J.A.S. Carruth, UK Y. Z. Chen, China P. Ferrer-Salvans, Spain W. Friesdorf, Germany R. L. Fournier, USA R. J. Green, UK J. Guttmann, Germany N. A. Habib, UK M. S. Hefzy, USA D. E. Herbert, USA D. Jones, Germany F. Korkusuz, Turkey D. Koutsouris, Greece S.M. Lavelle, Ireland D. Liepsch, Germany |
A. Litsky, USA Y. K. Liu, USA F. H.J. Lopes da Silva, Netherlands P. P. Lunkenheimer, Germany A. McBryde, USA J.-P. Morucci, France L. Nolte, Switzerland M. Parnianpour, USA M. H. Pope, Scotland P. Ruegsegger, Switzerland M. Sato, Japan C. N. Schizas, Cyprus A. Shirazi-Adl, Canada J. M. Thijssen, Netherlands S. T. Tumer, Turkey C. F. Wallroth, Germany S. L.-Y. Woo, USA Z. Y. Yan, China |
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